FR1000 Smart Nano Semiconductor Workstation

In-situ Doping & Surface Passivation

Innovation

Patent tech for in-situ physical property analysis of nanomaterials upon engineering.

Accuracy

Multifunctional vacuum system avoids physical transfer of sample and contamination.

AI Support

AI algorithm suggests analysis window and paramter based on frontier research and
simulation

Key Capabilities

  • Surface dopants/thin film deposition of organic species, metal oxides, noble metals and alkali metals, by using standard effusion cell (80 °C to 1000 °C), standard temperature effusion cell (300 °C to 1500 °C) or alkali metal dispenser configured effusion cells (specific for alkali metals).
  • Deposition rate precisely controlled and further calibration by quartz crystal microbalance (QCM).
  • Compact vacuum chamber enables efficient system pumping down and cooling for quick analysis.
  • Base pressure: 4E-8 mbar
  • Upon nitrogen ventilation, 1 h pumping, pressure: 8E-7 mbar; 12 h pumping, pressure: 8E-8 mbar

Electrical measurement of nanoscale devices located in high vacuum chamber is realized via 16 pins BNC connectors soldering with sample stage and further controlled by a source meter through cables. Disruptions from outside atmosphere are efficiently minimized with DC current noise level at 0.1 pA.

Various gas molecules can be introduced into the vacuum chamber via inlet valve to evaluate device stability or develop sensors. The amount of gas molecules dosed is controlled by monitoring the chamber pressure and the duration of gas leaking. Gas tubes are specially designed to connect with mechanical pump and turbo pump.

The sample stage is specially  designed for temperature varied  electrical measurement on sample. Temperature range from:

  • 77-400 K with liquid nitrogen 
  • 10-400 K with liquid helium

Samples are loaded into the 16 wires LLC chip carrier socket inside the  vacuum chamber through the front entry door.

Linear motion of sample stage in the system  enables the device to close enough to viewpoint  for optical and opto-electrical analysis. Compatible to various light sources:

  • Xenon light source (wide output spectrum  from 300 nm to 1000 nm).
  • Laser light source (405 nm, 473 nm, 515 nm and 638 nm). Laser light source is integrated with microscope-based fine focus setup to facilitate a fast focusing with a focused laser spot size of less than 4um in diameter.

Application Scenrios

In-situ Surface Doping

Gas Sensor Development

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Stability Test/Atmosphere Simulation

Composite Material Fabrication

Specifications